材料热处理学报

[1] 冯伟,杨斌,卢文壮.自支撑金刚石厚膜片的HFCVD法制备及摩擦学特性 [J].华南理工大学学报:自然科学版,2016,44(11):97-102.FENG Wei,YANG Bin,LU Wen-zhuang.Preparation and tribological properties of HFCVD-based freestanding thick diamond film[J].Journal of South China University of Technology:Natural Science Edition,2016,44(11):97-102

[2] 吕反修.化学气相沉积金刚石膜的研究与应用进展[J].材料热处理学报,2010,31(1):15-28.LU Fan-xiu.Progress in research and application development of CVD diamond film[J].Transactions of Materials and Heat Treatment,2010,31(1):15-28.

[3] Pehrsson P E,Celii F G,Butler J E.In Diamond Films and Coatings[M].Park Ridge:Noves Publications,NJ,1993:68.

[4] Vladimir L,Solozhenko,Eugene G.Synthesis of superhard materials [J].Materials Today,2005(8):44-51

[5] Kobashi K,Nishibayashi Y,Yokota Y,et al.R and D of diamond films in the frontier carbon technology project and related topics[J].Diamond and Related Materials,2003,12(3):233-240.

[6] Maypw.Diamond thin films:a 21st-century material [J].Philosophical Transactions of The Royal Society A,2000,(358):473-495.

[7] Liang Q,Yan C S,Meng Y,et al.Recent advances in high-growth rate single-crystal CVD diamond [J].Diamond and Related Materials,2009,18:698-703.

[8] 潘鑫.等离子体刻蚀增强CVD金刚石膜抛光的研究[D].武汉:武汉工程大学,2015.PAN Xin.Plasma etching enhance CVD diamond films polishing[D].Wuhan:Wuhan Institute of Technology,2015.

[9] 郭延龙,王淑云,袁孝,等.金刚石膜及类金刚石膜的光学应用研究进展[J].激光与光电子学进展,2008,45(7):44-51.GUO Yan-long,WANG Shu-yun,YUAN Xiao,et al.Research progress of optical application of diamond carbon films and diamond-like carbon films[J].Laser and Optoelectronics Progress,2008,45(7):44-51.

[10] 苑泽伟,金洙吉,李强,等.CVD金刚石化学机械抛光工艺研究[J].人工晶体学报,2016(1):73-79.YUAN Ze-wei,JIN Zhu-ji,LI Qiang,et al.Study on the chemical mechanical polishing technique of CVD diamond[J].Journal of Synthetic Crystals,2016(1):73-79.

[11] 段萌,张运强,潘国庆,等.CVD金刚石膜与常用红外光学材料抗砂蚀性能对比研究[J].表面技术,2017,46(6):270-275.DUAN Meng,ZHANG Yun-qiang,PAN Guo-qing,et al.Comparison of sand erosion resistance of CVD diamond film and common infrared optical materials[J].Surface Technology,2017,46(6):270-275.

[12] 刘辉,汪建华,翁俊,等.MPCVD制备大面积自支撑金刚石膜研究进展[J].真空与低温,2016,22(6):319-323.LIU Hui,WANG Jian-hua,WENG Jun,et al.Research progress in the large-area freestanding dlamond films by MPCVD[J].Vacuum and Cryogenics,2016,22(6):319-323.

[13] 向耿辉,邸永江,杨声平,等.HFCVD法制备金刚石薄膜影响因素的研究进展[J].广州化工,2016(3):20-22XIANG Geng-hui,DI Yong-jiang,YANG Sheng-ping,et al.Research progress on influencing factors in the HFCVD preparation of diamond films [J].Guangzhou Chemical Industry,2016(3):20-22

[14] 张克华,文东辉,袁巨龙.CVD金刚石薄膜表面抛光技术的研究[J].航空精密制造技术,2008,44(1):20-24.ZHANG Ke-hua,WEN Dong-hui,YUAN Ju-long.Study of polishing technology for CVD diamond thin films[J].Aviation Precision Manufacturing Technology,2008,44(1):20-24.

[15] 陈波,王小兵,程勇,等.军用纳米金刚石膜的研究与应用综述[J].光电子技术与信息,2003,16(4):1-7.CHEN Bo,WANG Xiao-bing,CHENG Yong,et al.Survey on the research and application of military nano diamond film [J].Optoelectronic Technology and Information,2003,16(4):1-7.

[16] Liang Q,Yan C S,Meng Y,et al.Recent advances in high-growth rate single-crystal CVD diamond [J].Diamond and Related Materials,2009,18:698-703.

[17] Lodes M A,Sailer S,Rosiwal S M,et al.Adhesive bonding and brazing of nanocrystalline diamond foil onto different substrate materials [J].Applied Surface Science,2013,(282):335-41.

[18] Zhang D,Shen B,Sun F,et al.Tudy on tribological behavior and cutting performance of CVD diamond and DLC films on Co-cemented tungsten carbide substrates[J].Applied Surface Science,2010,256(8):2479-2489.

[19] Karan S,Wang Q,Samitsu S,et al.Ultrathin free-standing membranes from metal hydroxide nanostrands [J].Journal of Membrane Science,2013(448):270-291.

[20] 李发宁,张鹤鸣,戴显英,等.宽禁带半导体金刚石[J].电子科技,2004(7):43-49.LI Fa-ning,ZHANG He-ming,DAI Xian-ying,et al.Wide bandgap diamond semiconductor[J].Electronic Science and Technology,2004(7):43-49.

[21] Wang T,Jiang X,Biermanns A,et al.Deposition of diamond /β-SiC composite gradient films by HFCVD:A competitive growth process [J].Diamond and Related Materials,2014,(42):41-48.

[22] Su Q,Shi W,Li D,et al.Effects of carbon concentration on properties of nano-diamond films [J].Applied Surface Science,2012,258(10):4645-4648.

[23] Ali M,Rgen M.Surface morphology,growth rate and quality of diamond films synthesized in hot filament CVD system under various methane concentrations [J].Applied Surface Science,2011,257(20):8420-8426.

[24] Rakha S A,Xintai Z,Zhu D,et al.Effects of N2 addition on nanocrystalline diamond films by HFCVD in Ar /CH4 gas mixture [J].Current Applied Physics,2010,10(1):171-175.

[25] Ullah M,Ahmed E.Influence of boron carbide on properties of CVD-diamond thin films at various deposition pressures [J].Current Applied Physics,2012,12(3):945-951.

[26] Salgueiredo E,Amaral M,Neto M A,et al.HFCVD diamond deposition parameters optimized by a taguchi matrix [J].Vacuum,2011,85(6):701-704.

[27] Man W D,Wang J H,Ma Z B,et al.Microwave plasma chemical vapor deposition-a promising technique for diamond films growth [J].Vacuum and Cryogenics,2003,9(1):50-56.

[28] Brunsteiner R,Haubner R,Lux B,et al.Influence of carbon monoxide—addition to the reaction gas on the hot-filament diamond deposition [J].International Journal of Refractory Metals and Hard Materials,1996,14(1):127-135.

[29] Huang W S,Tran D T,Asmussen J,et al.Synthesis of thick,uniform,smooth ultrananocrystalline diamond films by micro-wave plasma-assisted chemical vapor deposition [J].Diamond and Related Materials,2006,15(2):341-344.

[30] King D,Yaran M K,Schuelke T,et al.Scaling the microwave plasma-assisted chemical vapor diamond deposition process to 150-200 mm substrates [J].Diamond and Related Materials,2008,17(4):520-524.

[31] Vikharev A L,Gorbachev A M,Kozlov A V,et al.Diamond films grown by millimeter wave plasma-assisted CVD reactor [J].Diamond and Related Materials,2006,15(4):502-507.

[32] Mallik A K,Bysakh S,Dutta S,et al.Correlation between optical emission spectra and the process parameters of a 915 MHz microwave plasma CVD reactor used for depositing polycrystalline diamond [J].Proceedings of The Indian Academy of Sciences-Mathematical Sciences,2014,39(4):957-970.

[33] Zhu W,Wang X H,Pickrell D J,et al.The oxidation of CVD diamond films [J].Carbon,1990,28(6):796.

[34] Celii F G,White Jr D,Purdes A J,et al.The effect of gas-phase residence time[C]//Proceedings of the Second International Symposium on Diamond Materials Electrochemical Society,1991.

[35] Celii F G,White Jr D,Purdes A J.Effect of residence time on microwave plasma chemical vapor deposition of diamond [J].Journal of applied physics,1991(70):5636-5646.

[36] Sun Y,Xu X D,Sun D Y,et al.Immunoblots of integrin-like proteins in pollen tube membrane of hemerocallis citrina [J].Acta Botanica Sinica 1998,40(7):680-682.

[37] Yu J,Huang R,Wen L,et al.Nucleation kinetics of diamond in hot filament chemical vapor deposition [J].Materials research bulletin,1999,34(14):2319-2325.

[38] Chen W,Lu X,Yang Q,et al.Effects of gas flow rate on diamond deposition in a microwave plasma reactor [J].Thin Solid Films,2006,515(4):1970-1975.

[39] 翁俊,刘繁,孙祁,等.氮气体积浓度对高微波功率沉积金刚石膜的影响 [J].金刚石与磨料磨具工程,2015,35(207):23-28.WENG Jun,LIU Fan,SUN Qi,et al.Influence of nitrogen concentration on the deposition of diamond films with high microwave power [J].Diamond and Abrasives Engineering,2015,35(207):23-28.

[40] Katz I,Gardner B,Jongeward G,et al.A model of plasma contactor behavior in the laboratory[C]//AIAA,Aerospace Sciences Meeting and Exhibit,34 th,Reno,1996.

[41] Capacci M,Minucci M,Severi A,et al.Simple numerical model describing discharge parameters in orificed hollow cathode devices [J].AIAA Paper,1997(791):6-9.

[42] Fearn D G,Philip C M.An investigation of physical processes in a hollow cathode discharge [J].Aiaa Journal,1973,11(2):131-132.

[43] Delcroix J L,Trindade A R.Hollow cathode arcs [J].Advances in Electronics and Electron Physics,1974(35):87-190.

[44] Siegfried D E,Wilbur P J.An investigation of mercury hollow cathode phenomena [R].AIAA,1978.

[45] Vikharev A L,Gorbachev A M,Kozlov A V,et al.Microcrystalline diamond growth in presence of argon in millimeter-wave plasma-assisted CVD reactor [J].Diamond and Related Materials,2008,17(7):1055-1061.

[46] Tang C J,Fernandes A J S,Girao A V,et al.Role of high microwave power on growth and microstructure of thick nanocrystalline diamond films:A comparison with large grainpolycrystalline diamond films [J].Journal of Crystal Growth,2014,89:83-91.

[47] Tang C J,Neves A J,Pereira S,et al.Effect of nitrogen and oxygen addition on morphology and texture of diamond films(from polycrystalline to nanocrystalline)[J].Diamond and Related Materials,2008,17(1):72-78.

[48] Tang C J,Fernandes A J S,Granada M,et al.High rate growth of nanocrystalline diamond films using high microwave power and pure nitrogen/methane/hydrogen plasma [J].Vacuum,2015,(122):42-346.

[49] Vojs M,Varga M,Babchenko O,et al.Structural and electrical characterization of diamond films deposited in nitrogen/oxygen containing gas mixture by linear antenna microwave CVD process [J].Applied Surface Science,2014(312):226-230.

[50] Potocky S,Cada M,Babchenko O,et al.Perspectives of linear antenna microwave system for growth of various carbon nano-forms and its plasma study [J].Physica Status Solidi B,2013,250(12):2723-2726.

[51] Xiao X,Birrell J,Gerbi J E,et al.Low temperature growth of ultrananocrystalline diamond [J].Journal of Applied Physics,2004,96(4):2232-2239.

[52] Izak T,Babchenko O,Varga M,et al.Low temperature diamond growth by linear antenna plasma CVD over large area [J].Physica Status Solidi(b),2012,249(12):2600-2603.

[53] Tsugawa K,Ishihara M,Kim J,et al.Nanocrystalline diamond film growth on plastic substrates at temperatures below 100 ℃ from low-temperature plasma [J].Physical Review B,2010,82(12):1-8.

[54] Tang C J,Neves A J,Gracio J,et al.A new chemical path for fabrication of nanocrystalline diamond films [J].Journal of Crystal Growth,2008,310(2):261-265.

[55] Tang C J,Abe I,Fernandes A J S,et al.A new regime for high rate growth of nanocrystalline diamond films using high power and CH4/H2/N2/O2 plasma [J].Diamond and related materials,2011,20(3):304-309.

[56] Panda K,Kumar N,Panigrahi B K,et al.Effect of N+ ion implantation on micro/nanotribological properties of nanocrystalline diamond films [J].Tribology International,2013,57:184-194.

[57] Huangteb,Tang W Z,Lufx,et al.Influence of plasma power over growth rate and grain size during diamond deposition using DC arc plasma jet CVD [J].Thin Solid Films,2003(429):108-113.

[58] Li C,Wang L,Chen L,et al.Free-standing diamond films deposited by DC arc plasmajet on graphite substrates with a destroy able Ti interlayer [J].Diamondand and Related Materials,2009(1811):1348-1352.

[59] Lu F X,Zhong G F,Sun J G,et al.A new type of DC arc plasma torch for low cost large area diamond deposition [J].Diamond and Related Materials 1998(76):737-741.

[60] Guo J,Li C,Liu J,et al.Structural evolution of Ti destroyable interlayer in large-size diamond film deposition by DC arc plasma jet [J].Applied Surface Science 2016(370):237-242.

[61] Li C M,Zhu R H,Liu J L,et al.Effect of arc characteristics on the properties of large size diamond wafer prepared by DC arc plasma jet CVD [J].Diamond and Related Materials,2013(39):47-52.

[62] Huang T B,Tang W Z,Lu F X,et al.Argon-to-hydrogen ratio in plasma jet diamond chemical vapour deposition [J].Surface and Coatings Technology 2005(1901):48-53.

[63] Dalibon E L,Escalada L,Simison S,et al.Mechanical and corrosion behavior of thick and soft DLC coatings [J].Surface and Coatings Technology,2017(312):101-109.

[64] Golubkov V A,Ivanov A S,Ilyin V A,et al.Stabilizing effect of diamond thin film onnanostructured silicon carbide feld emission array [J].Journal of Vacuum Science and Technology B,2016,34(6):0622026.

[65] 曲敬信.表面工程手册[M].北京:化学工业出版社,1997.

[66] Awasthi S,Goel S,Pandey C P,et al.Multi-length scale tribology of electrophoretically deposited nickel-diamond coatings [J].The Journal of The Minerals,Metals and Materials Society,2017,69(2):227-235.

[67] Venkatesh V,Swain N,Srinivas G.et al.Review on the machining characteristics and research prospects of conventional microscale machining operations [J].Materials and Manufacturing Processes,2017,32(3):235-262.

[68] Metcalfe A,Fern G R,Hobson P R,et al.Diamond based detectors for high temperature,high radiation environments [J].Journal of Instrumentation,2017(12):1-11.

[69] 韩荣耀.CVD金刚石膜钝头体飞行温度与压力的仿真研究[D].南京:南京航空航天大学,2007,1-10.

[70 ] 吝君瑜,王小兵,程勇.金刚石薄膜及其在军事光学元件上的应用与制备 [J].国防技术基础,2003,(6):22-24.LIN Jun-yu,WANG Xiao-bin,CHENG Yong.Diamond film and its application and preparation on military optical components[J].Technology Foundation of National Defence,2003,(6):22-24.

[71] Jia X Y,Huang N,Guo Y N,et al.Growth behavior of CVD diamond films with enhanced electron field emission properties over a wide range of experimental parameters [J].Journal of Materials Science and Technology,2018(34):2398-2406.

[72] Xu H Q,Zang J B,Tian P F,et al.Surface conversion reaction and high efficient grinding of CVD diamond films by chemically mechanical polishing [J].Ceramics International,2018(44):21641-21647

[73] 于盛旺,刘艳青,唐伟忠,等.高功率 MPCVD 金刚石膜透波窗口材料制备研究 [J].人工晶体学报,2012,41(4):896-899.YU Sheng-wang,LIU Yan-qing,TANG Wei-zhong,et al.Synthesis of diamond film as electromagnetic window material by an ellipsoidal MPCVD reactor at high input microwave power levels [J].Journal of Synthetic Crystals,2012,41(4):896-899.

[74] Klein C A.Diamond windows and domes:flexural strength and thermal shock [J].Diamond and Related Materials,2002(11):218-227.

[75] Pickles C S J,Madgwick T D,Sussmann R S,et al.Optical performance of chemically vapour-deposited diamond at infrared wavelengths research article [J].Diamond and Related Materials,2000(9):916-920.

[76] Bolshakov A P,Zyablyuk K N,Kolyubin V A,et al.Thin CVD diamond film detector for slow neutrons with buried graphitic electrode [J].Nuclear Instruments and Methods In Physics Research Section A-Accelerators Spectrometers Detectors And Associated Equipment,2017(871):142-147.

[77] Lloret,F,Araujo D,Villar M P,et al.Diamond underlayer microstructure effect on the orientation of AlN piezoelectric layers for high frequency SAW resonators by TEM [J].Microelectronic Engineering,2013(112):193-197.

[78] Li C M,Liu J L,Chen L X,et al.An amazing semiconductor choice for high-frequency FET:H-terminated polycrystalline diamond film prepared by DC arc jet CVD [J].Physica Status Solidic:Current Topics In Solid State Physics,2014(11):11-12.

[79] Kloss F R,Francis L A,Sternschulte H,et al.Commercial development sof nano-crystalline diamond-Twopro to type sascase studies [J].Diamond and Related Materials,2008(17):1089-1099.

[80] Khanna P,Villagra A,Kim S,et al.Use of nanocrystalline diamond for microfluidic lab-on-a-chip [J].Diamond and Related Materials,2006(15):2073-2077.

[81] Pei S S,Loh K P,Wei C P,et al.Biosensing properties of nanocrystalline diamond film grown on polycrystalline diamond electrodes [J].Diamond and Related Materials,2005(14):426-431.

[82] Adamschik M,Hinz,M,Maier C,et al.Diamond micro system for bio-chemistry [J].Diamond and Related Materials,2001(10):722-730.