Ti2AlN薄膜的抗高温氧化性能High temperature oxidation resistance of Ti2AlN films
王蕾,刘佳磊,金松哲
摘要(Abstract):
采用多弧离子镀技术和后续的真空退火工艺在06Cr19Ni10不锈钢基体上制备了Ti_2AlN薄膜。重点研究了Ti_2AlN薄膜的抗高温氧化性能,并与TiN薄膜进行对比。分析结果表明:温度低于800℃时,Ti_2AlN薄膜能够保持良好的抗高温氧化性能;TiN和Ti_2AlN的氧化抛物线速率分别约为1.5×10~(-6)mg~2·cm~(-4)·s~(-1)和5×10~(-7)mg2·cm~(-4)·s~(-1),说明Ti_2AlN的抗高温氧化性能优于TiN;与TiN镀层氧化后形成絮状氧化物不同,Ti_2AlN薄膜经高温氧化后表面生成具有致密连续性的Al_2O_3氧化物,进一步提高了Ti_2AlN薄膜的抗高温氧化性能。
关键词(KeyWords): 多弧离子镀;Ti2AlN薄膜;抗高温氧化性能
基金项目(Foundation): 吉林省科技厅资助项目(20070511)
作者(Author): 王蕾,刘佳磊,金松哲
DOI: 10.13289/j.issn.1009-6264.2015.s2.026
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