袁盛章,王海斗,董丽虹,刘彬,秦红玲

• 1:三峡大学机械与动力学院
• 2:陆军装甲兵学院机械产品再制造国家工程研究中心
• 3:陆军装甲兵学院再制造技术国防科技重点实验室
• 4:江苏科技大学材料科学与工程学院

摘要(Abstract)：

传统等离子体渗氮存在着渗氮时间长、渗氮不均匀等问题，因此提高等离子体渗氮效果和渗氮速率是等离子体渗氮技术发展的重点方向。本文综述了活性屏等离子体渗氮的技术原理和近年来的发展特点，梳理了多元离子共渗、表面自纳米化预处理和预氧化3种催化技术在传统等离子体渗氮过程中的作用机理和目前的发展现状。多种催化技术相结合的传统等离子体渗氮工艺和活性屏等离子体渗氮的催化工艺将是未来等离子体渗氮发展的重要方向。

关键词(KeyWords)： 活性屏等离子体渗氮;多元离子共渗;表面自纳米化;预氧化

Abstract:

Keywords:

基金项目(Foundation): 某类重点项目(ZD-302-12);; 国家自然科学基金(52175206,52130509)

作者(Author): 袁盛章,王海斗,董丽虹,刘彬,秦红玲

DOI: 10.13289/j.issn.1009-6264.2023-0105

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