沉积温度及其变化对金刚石膜内黑色缺陷产生过程的影响Relation between changes in deposition temperature and formation of dark features in diamond films
姜春生,刘政,郭世斌,李晓静,唐伟忠,吕反修,郭辉
摘要(Abstract):
用高功率直流电弧等离子体喷射方法研究金刚石膜沉积温度稳定性对膜中黑色缺陷产生的影响。结果表明,在温度稳定条件下制备的金刚石膜中,黑色缺陷的密度较低;当沉积温度大幅度变化时,在膜中产生大量黑色缺陷。形成大量黑色缺陷的原因是:沉积温度变化时,在金刚石晶粒的表面形成贯穿型孪晶,而在随后的生长过程中,这些孪晶的长大将抑制金刚石膜局部生长环境中活化的反应气体与其下晶界位置的金刚石组织接触,导致其生长缓慢并保留在金刚石膜中,从而形成大量黑色缺陷。
关键词(KeyWords): 金刚石膜;黑色缺陷;孪晶;电子背散射衍射
基金项目(Foundation): 国家自然科学基金(10675017);; 高等学校博士学科点基金(20060008013)
作者(Author): 姜春生,刘政,郭世斌,李晓静,唐伟忠,吕反修,郭辉
DOI: 10.13289/j.issn.1009-6264.2010.03.024
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