朱生发,吴艳萍,刘天伟,黄河,江帆,唐凯,魏强

• 1:中国工程物理研究院
• 2:表面物理与化学重点实验室

摘要(Abstract)：

为改善金属铀基体的抗腐蚀性能,采用非平衡磁控溅射离子镀技术在不同偏压下于金属铀表面制备CrNx薄膜。采用SEM和AFM研究了薄膜形貌和表面粗糙度,采用X射线光电子能谱研究了薄膜表面的元素分布及化学价态。试验结果表明,采用磁控溅射在较低脉冲偏压下沉积的CrNx薄膜晶粒较细小,偏压越高,表面粗糙度越大。生成的薄膜为Cr+CrN+Cr2N混合结构,并含有少量的Cr2O3,随着偏压的升高,金属态Cr的含量减少,而铬的氮化物的含量增加,所制备薄膜的自然腐蚀电位升高,腐蚀电流密度减小。偏压为-800 V时,所制备的薄膜具有较好的抗腐蚀性能。

关键词(KeyWords)： 贫铀;非平衡磁控溅射;CrNx薄膜

Abstract:

Keywords:

基金项目(Foundation): 中国工程物理研究院科学技术发展基金(2009B0203019)

作者(Author): 朱生发,吴艳萍,刘天伟,黄河,江帆,唐凯,魏强

DOI: 10.13289/j.issn.1009-6264.2012.05.028

参考文献(References)：

• [1]Bland R D,McDonald J E,Mattox D M.Ion-plated coatings for the corrosion protection of uranium[R].SC-DR-65-519,1965.
• [2]Chang F,Levy M,Jackman B.Assessment of corrosion-resistant coatings for a depleted uranium-0.75titanium alloy[J].Surface and CoatingsTechnology,1991,48(1):31-39.
• [3]鲜晓斌,刘柯钊,吕学超,等.铀表面循环Ar+轰击磁控溅射离子镀Ti研究[J].稀有金属材料与工程,2003,32(1):67-69.XIAN Xiao-bin,LIU Ke-zhao,LU Xue-chao,et al.Ti coatings on uranium substrates by repeated Ar+bombardment magnetron sputter ion plated[J].Rare Metal Materials and Engineering,2003,32(1):67-69.
• [4]吕学超,鲜晓斌,张永彬,等.金属铀与铝薄膜界面的俄歇电子能谱研究[J].原子能科学技术,2002,36(3):202-204.LU Xue-chao,XIAN Xiao-bin,ZHANG Yong-bin,et al.Study on the interface between metal uranium and aluminum film by auger electronspectroscopy[J].Atomic Energy Science and Technology,2002,36(3):202-204.
• [5]王庆富,鲜晓斌,刘柯钊,等.脉冲偏压对贫铀表面磁控溅射离子镀铝结合强度的影响[J].原子能科学技术,2007,41(3):268-272.WANG Qing-fu,XIAN Xiao-bin,LIU Ke-zhao,et al.Effect of pulse bias voltage on adhesive strength of magnetron sputtering ion plated al coating ondepleted uranium surface[J].Atomic Energy Science and Technology,2007,41(3):268-272.
• [6]Liu T W,Dong C,Wu S,et al.TiN,TiN gradient and Ti/TiN multi-layer protective coatings on uranium[J].Surface and Coatings Technology,2007,201:6737-6741.
• [7]LIU Tian-wei,Deng Xin-lu,Wang Xiao-ying,et al.Structures and properties of ZrN films prepared by ecr-microwave plasma source enhanced direct-current magnetron sputtering under different N2 partial pressures[J].Chinese Physics letters,2004,21(10):2008-2011.
• [8]Lin Jianliang,William D S,Moore J J,et al.High rate deposition of thick Crnd Cr2N coatings using modulated pulse power(MPP)magnetronsputtering[J].Surface and Coatings Technology,2011,205:3226-3234.
• [9]Elangovan T,Kuppusami P,Thirumurugesan R,et al.Nanostructured CrN thin films prepared by reactive pulsed DC magnetron sputtering[J].Materials Science and Engineering B,2010,167:17-25.
• [10]Wan X S,Zhao S S,Yang Y,et al.Effects of nitrogen pressure and pulse bias voltage on the properties of Cr-N coatings deposited by arc ion plating[J].Surface and Coatings Technology,2010,204:1800-1810.
• [11]Lippitz A,Hubert T.XPS investigations of chromium nitride thin films[J].Surface and Coatings Technology,2005,200:250-253.

文章评论(Comment)：