脉冲偏压电弧离子镀Ti/TiN纳米多层薄膜的结构与硬度
李谋,李晓娜,林国强,张涛,董闯,闻立时
摘要(Abstract)：
采用脉冲偏压电弧离子镀设备在高速钢基体上沉积Ti/TiN纳米多层硬质薄膜,通过仅改变偏压幅值的方法进行对比实验。XRD分析和薄膜断截面SEM形貌显示出薄膜的纳米多层组织结构;硬度测试表明纳米多层薄膜硬度随脉冲偏压升高而升高,在-900V时超过同等条件制备的TiN单层薄膜,硬度高达34.1GPa;分析表明硬度的提高主要与脉冲偏压工艺对薄膜组织的改善有关;用脉冲偏压电弧离子镀可以制备纳米多层硬质薄膜,并且在工艺控制上相对简单。
关键词(KeyWords)： 脉冲偏压;电弧离子镀;Ti/TiN纳米多层;硬质薄膜
基金项目(Foundation): 中国高技术研究发展(863)计划(2002AA302507)
作者(Author): 李谋,李晓娜,林国强,张涛,董闯,闻立时
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