王敏,郭会勇,黄文波,李文芳

• 1:广东技术师范学院机电学院
• 2:华南理工大学材料科学与工程学院

摘要(Abstract)：

将工业纯Ti板(99.5%)分别置于Ba(OH)2、Sr(OH)2+NaOH溶液中微弧氧化制备BaTiO3和SrTiO3陶瓷薄膜。XRD分析表明:所制备的薄膜分别主要由四方相BaTiO3和立方相SrTiO3组成。测得最优工艺条件下所得两种薄膜在100 Hz下的介电常数分别为152.3和419.1,介质损耗(tanδ)值分别为0.096和0.045。重点研究了微弧氧化工艺参数对薄膜生长的影响规律,结果表明:随着电解液溶度、电流密度的增加以及电流频率的降低,薄膜的生长速度加快;提出并验证了薄膜生长动力学的经验公式。

关键词(KeyWords)： 微弧氧化;钛酸钡;钛酸锶;介电性能

Abstract:

Keywords:

基金项目(Foundation): 中国博士后科学基金特别资助项目(200902317)

作者(Author): 王敏,郭会勇,黄文波,李文芳

DOI: 10.13289/j.issn.1009-6264.2012.05.009

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