喻利花,王杰,许俊华

• 1:江苏科技大学材料科学与工程学院
• 2:江苏省先进焊接技术重点实验室

摘要(Abstract)：

采用多靶磁控溅射仪,制备不同Al含量的(V,W,Al)N复合膜。利用X射线衍射仪、纳米压痕仪和热处理炉及热失重分析仪对(V,W,Al)N复合膜的微观组织、力学性能及高温抗氧化性能进行表征。结果表明:当Al含量低于14.86 at%时,(V,W,Al)N复合膜存在面心立方结构(V,W)N、WN相及六方结构V2N相,当Al含量高于14.86 at%时,薄膜存在面心立方结构(V,W)N、WN相及六方结构V2N和AlN相;随Al原子百分含量的增加,复合膜的硬度呈先增大后减小的趋势,当Al原子百分含量达到14.86 at%时,其硬度最大值为35.5 GPa;随Al含量的增加,(V,W,Al)N复合膜抗氧化性能提高了至少200℃。讨论Al含量对(V,W,Al)N复合膜性能的影响。

关键词(KeyWords)： (V,W,Al)N复合膜;微观组织;力学性能;抗氧化性能

Abstract:

Keywords:

基金项目(Foundation): 国家自然科学基金(51074080)

作者(Author): 喻利花,王杰,许俊华

DOI: 10.13289/j.issn.1009-6264.2014.10.032

参考文献(References)：

• [1]Yan-zuo Tsai,Jenq-gong Duh.Thermal stability and microstructure characterization of CrN/WN multilayer coatings fabricated by ion-beam assisted deposition[J].Surface&Coatings Technology,2005,200:1683-1689.
• [2]LU Yan-hong,JI Li,LIU Xiao-gong,et al.Inuence of substrate bias voltage on structure and properties of the CrAlNlms deposited by unbalanced magnetron sputtering[J].Applied Surface Science,2012,258:3864-3870.
• [3]Bin Deng Ye Tao,Dellang Guo.Effects of vanadium ion implantation on microstructure,mechanical and tribological properties of TiN coatings[J].Applied Surface Science,2012,258:9080-9086.
• [4]Du-cheng Tsai,Yen-lin Huang,Sheng-ru Lin,et al.Effect of nitrogenow ratios on the microstructure and properties of(TiVCr)N coatings by reactive magnetic sputtering[J].Nuclear Instruments and Methods in Physics Research B,2011,269:685-691.
• [5]汝强,胡社军,陈俊芳,等.TC11钛合金表面电弧离子镀TiAlN涂层防护性能的研究[J].金属热处理,2006,31(7):33-36.RU Qiang,HU Jun-she,CHEN Jun-fang,et al.Protection properties of TiAlN coating prepared by arc ion plating on TC11 titanium alloy[J].Heat Treatment of Metals,2006,31(7):33-36.
• [6]Harish C Bashilia,Selcakumar N,Deepthi B,et al.A comparative study of reactive direct current magnetron sputtered CrAlN and CrN coatings[J].Surface&Coatings Technology,2006,201:2193-2201.
• [7]Eun Young Choi,Myung Cgang Kang,Dong Hee Kwon,et al.Comparative studies on microstructure and mechanical properties of CrN,Cr-C-N and CrMo-N coatings[J].Journal of Materials Processing Technology,2007,187-188:566-570.
• [8]Harish C.Barhilia,Yogesh K,Rajam K S.Deposition of TiAlN coatings using reactive bipolar-pulsed direct current unbalanced magnetron sputtering[J].Vacuum,2009,83:427-434.
• [9]Franz R,Lechthaler M,Polzer C,et al.Oxidation behaviour and tribological properties of arc-evaporated ZrAlN hard coatings[J].Surface&Coatings Technology,2012,206:2337-2345.
• [10]Yasuo Tanno,Akiao Azushima.Frictional property of Ti-B-N coating with preferred grain orientations deposited by arc ion plating under dry condition[J].Surface&Coatings Technology,2009,203:3631-3637.
• [11]WU Wan-yu,WU Chia-hao,XIAO Bo-hong,et al.Microstructure,mechanical and tribological properties of CrWNlms deposited by DC magnetron sputtering[J].Vacuum,2013,87:209-212.
• [12]Araiza J J,Sánhez O,Albella J M.Infiuence of the aluminum incorporation on the structure of sputtered ZrNxlms deposited at low temperatures[J].Vacuum,2009,83:1236-1239.
• [13]Glaser A,Surney S,Netner F P,et al.Oxidation of vanadium nitride and titanium nitride coatings[J].Surface Science,2007,601:1153-1159.
• [14]许俊华,曹俊,喻利花.TiVCN复合膜的微结构、力学性能与摩擦磨损性能的研究[J].金属学报,2012,48(5):555-560.XU Jun-hua,CAO Jun,YU Li-hua.Microstructures,mechannical properties and friction properties of TiVCN composite films[J].Acta Metallurgica Sinica,2012,48(5):555-560.
• [15]WU Wan-yu,WU Chia-hao,XIAO Bo-hong,et al.Microstructure,mechanical and tribological properties of CrWNlms deposited by DC magnetron sputtering[J].Vacuum,2013,87:209-212.
• [16]Fox-Rabinovich G S,Yamamoto K,Veldhuis S C,et al.Self-adaptive wear behavior of nano-multilayered TiAlCrN/WN coatings under severe machining conditions[J].Surface&Coatings Technology,2006,201:1852-1860.
• [17]Thomas Reeswinkel,Davide G Sangiovanni,Valeriu Chirita,et al.Structure and mechanical properties of TiAlN/WNx thinlms[J].Surface&Coatings Technology,2011,205:4821-4827.
• [18]李学梅,尤建飞,董松涛,等.Ti2Si2Al2N纳米复合膜的组织与性能[J].材料热处理学报,2009,30(6):144-148.LI Xue-mei,YOU Jian-fei,DONG Song-tao,et al.The microstructure and properties of Ti2Si2Al2N nano-composite films[J].Transactions of Materials and Heat Treatment,2009,30(6):144-148.
• [19]钟春良,董师润,喻利花,等.Cr1-xAlxN涂层的微结构和抗氧化性能研究[J].表面技术,2007,36(6):12-14.ZHONG Chun-liang,DONG Shi-run,YU Li-hua,et al.Study on the microstructure and properties of Cr1-xAlxN coating[J].Surface Technology,2007,36(6):12-14.
• [20]葛云科,顾晓波,喻利花,等.(Zr,Al)N薄膜的微结构及性能研究[J].材料开发与应用,2008,23(1):21-25.GE Yun-ke,GU Xiao-bo,YU Li-hua,et al.Study on the microstructure and properties of(Zr,Al)N films[J].Development and Application of Materials,2008,23(1):21-25.
• [21]喻利华,薛安俊,董松涛,等.Si含量对Ti-Al-Si-N薄膜微结构与力学性能的影响[J].材料热处理学报,2010,31(7):140-145.YU Li-hua,XUE An-jun,DONG Song-tao,et al.Effect on the microstructure and mechanical properties of Ti-Al-Si-N films with the Al contents[J].Transactions of Materials and Heat Treatment,2010,31(7):140-145.
• [22]罗飞,何欣,杨会生,等.溅射工艺对TiAlN薄膜摩擦学性能的影响[J].航空材料学报,2007,27(2):33-36.LUO Fei,HE Xin,YANG Hui-sheng,et al.Effect of processing condition on the tribological property of sputtered TiAlN thin films[J].Journal of Aeronautical Materials,2007,27(2):33-36.
• [23]秦聪祥,胡社军,汝强.Al含量对真空电弧沉积ZrAlN薄膜性能的影响[J].材料保护,2007,40(3):1-4.QIN Cong-xiang,HU She-jun,RU Qiang.Effects of the properties of ZrAlN films with the Al contents[J].Materials Protection,2007,40(3):1-4.
• [24]Harish C Barshilia,Selvakumer N,Deepthi B,et al.A comparative study of reactive direct current magnetron sputtered CrAlN and CrN coatings[J].Surface&Coatings Technology,2006,201:2193-2201.
• [25]Yang J F,Yuan Z G,Liu Q,et al.Characterization of Mo-Al-N nanocrystallinelms synthesized by reactive magnetron sputtering[J].Materials Research Bulletin,2009,44:86-90.
• [26]周志烽,范玉殿.薄膜热应力的研究[J].真空科学与技术,1996,16(5):347-354.ZHOU Zhi-feng,FAN Yu-dian.A study of thermal stress in thin films[J].Vacuum Science and Technology(China),1996,16(5):347-354.
• [27]申雁鸣,贺洪波,邵淑英,等.沉积温度对电子束蒸发HfO2薄膜残余应力的影响[J].中国激光,2006,33(6):827-831.SHEN Yan-ming,HE Hong-bo,SHAO Shu-ying,et al.Influences of deposition temperature on residual stress of HfO2films prepared by electron beam evaporation[J].Chiese Journal of Lasers,2006,33(6):827-831.
• [28]文懋.NbN、WNX单层膜以及NbN基多层膜的微观结构和力学性能的研究[D].吉林:吉林大学,2010.WEN Mao.Microstructure and mechanical properties for NbN,WNXmonolayer and NbN-based multilayer films[D].Jilin:Jilin University,2010.
• [29]王惠,马德军.残余压应力场中薄膜纳米测量硬度的变化与校正[J].研究探讨,2005,11:70-72.WANG Hui,MA De-jun.Changes and crrection of nanoindentation hardness of thin solid films measured in residual compressive stress field[J].Research and Discussion,2005,11:70-72.
• [30]LIN Jian-liang,Malki Pinkas,Willliam D Sproul,et al.The phase and microstructure of CrAlNlms deposited by pulsed dc magnetron sputtering with synchronous and asynchronous bipolar pulses[J].Thin Solid Films,2011,520:166-173.
• [31]Farges G,Beauprez E,Degout D.Preparation and characterization of V-N films deposited by reactive triode magnetron sputtering[J].Surface and Coatings Technology,1992,54-55:115-120.
• [32]王永康,雷廷权,夏立芳,等.Ti0.5Al0.5N涂层的抗高温氧化行为[J].材料工程,2001,1(1):12-14.WANG Yong-kang,LEI Ting-quan,XIA Li-fang,et al.The oxidation resistant behavior of Ti0.5Al0.5N coating at elevated temperature[J].Journal of Materials Engineering,2001,1(1):12-14.
• [33]张馨元,赵广彬,孙爱祥,等.非平衡磁控溅射T i A l N薄膜的高温抗氧化性能研究[J].真空,2011,48(5):61-63.ZHANG Xin-yuan,ZHAO Guang-bin,SUN Ai-xiang,et al.On the high-temperature oxidation resistance of TiAlN films deposited by unbalanced magnetron sputtering[J].Vacuum,2011,48(5):61-63.
• [34]Lin J,Mishra B,Moore J J,et al.et al.A study of the oxidation behavior of CrN and CrAlN thin films in air using DSC and TGA analyses[J].Surface&Coatings Technology,2008,202:3272-3283.
• [35]余春燕,王杜斌,尹小定,等.CrAlN薄膜高温抗氧化性的研究[J].稀有金属材料与工程,2009,38(6):1015-1018.YU Chun-yan,WANG Du-bin,YI Xiao-ding,et al.Study on the high temperature oxidation resistance of CrAlN films[J].Rare Metal Materials and Engineering,2009,38(6):1015-1018.

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