冯雨,郭悦,戴方钦,刘宝志,李艳霞,尉冬,常朋

• 1:武汉科技大学高性能钢铁材料及其应用省部共建协同创新中心
• 2:威丰稀土电磁材料股份有限公司
• 3:武汉山力板带技术工程有限公司

摘要(Abstract)：

对取向硅钢在不同气氛下的高温退火工艺进行实验室模拟，利用X射线衍射仪(XRD)分析了硅钢退火至900℃和1170℃时的样品表面氧化层和底层的物相组成，采用场发射扫描电镜(SEM)观察了样品表面氧化层和底层在截面方向上的微观形貌特征，并计算了高温退火一次升温阶段氧化反应的吉布斯自由能以及900℃时退火气氛的氧分压。结果表明：当退火气氛的露点温度保持一定时，较高的氢气含量有利于生成完整连续的底层；当退火气氛的水氢分压比保持一定时，在露点温度与氢气含量两者较低的条件下，底层附着性不佳易脱落，较高条件下，底层中夹杂着较多的铁单质；当氧化层中无FeO时，底层完整连续但易脱落，当FeO层较薄时，底层下方存在部分未反应的SiO_2,当FeO层较厚时，底层不完整连续且有分层。

关键词(KeyWords)： 取向硅钢;退火气氛;内氧化层;硅酸镁底层

Abstract:

Keywords:

基金项目(Foundation): 湖北省教育厅中青年人才资助项目(Q20211106)

作者(Author): 冯雨,郭悦,戴方钦,刘宝志,李艳霞,尉冬,常朋

DOI: 10.13289/j.issn.1009-6264.2022-0246

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