热处理气氛对铈离子掺杂SiO2发光性能的影响Effect of heat treating ambience on luminescent properties of cerium doped silica
徐光青,郑治祥,汤文明,吴玉程
摘要(Abstract):
采用溶胶-凝胶技术制备了Ce3+离子掺杂的SiO2粉体,并在H2、Ar和空气三种气氛中分别进行1000℃保温2h的热处理。采用红外光谱仪、紫外-可见吸收光谱仪以及荧光光谱仪对热处理前后成分以及光学性能进行测试,研究不同气氛中的热处理对SiO2粉体中的Ce3+离子光学性能的影响。结果表明,在H2和Ar气氛中热处理,相对于空气气氛而言,样品的发光强度有明显的增强。其中H2气氛中处理的样品发光强度约为空气气氛中处理样品发光强度的12倍。同时热处理气氛的改变也可以通过影响Ce3+离子配位场使其发光波长产生漂移,氢气中处理的样品发光峰位于435nm,氩气中处理的样品发光峰位于455nm,而空气中处理的样品发光峰位于445nm。
关键词(KeyWords): 发光性能;气氛;Ce3+离子掺杂;二氧化硅
基金项目(Foundation): 合肥工业大学中青年创新基金(103-037016)
作者(Author): 徐光青,郑治祥,汤文明,吴玉程
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