高建杰,汤文明,吴玉程,郑治祥

• 1:合肥工业大学材料科学与工程学院

摘要(Abstract)：

使用扫描电子显微镜、电子能谱仪、X射线衍射等研究了在N2气氛中1150℃×10 h等温热处理的Si3N4/Ni,Si3N4/Ni3Al平面偶界面固相反应区的形貌、成分分布、显微结构及相组成。结果表明:Si3N4/Ni界面固相反应形成约20μm厚的反应区,反应区主要由Ni3Si构成,其中分布着大量细密的孔洞;而Si3N4/Ni3Al界面固相反应形成约2μm厚的反应区,反应区具有比Ni3Al高得多的Al含量,反应区由NiAl及Ni3Si构成。Si3N4/Ni3Al具有比Si3N4/Ni高得多的界面化学相容性。

关键词(KeyWords)： Si3N4;Ni3Al;界面固相反应;显微结构;相组成

Abstract:

Keywords:

基金项目(Foundation): 安徽省自然科学基金(050440704)

作者(Author): 高建杰,汤文明,吴玉程,郑治祥

DOI: 10.13289/j.issn.1009-6264.2010.02.015

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