曹军,丁雨田,卢振华,胡勇

• 1:兰州理工大学有色金属新材料国家重点实验室

摘要(Abstract)：

利用扫描电镜、X射线衍射仪和氧化称重实验对铜表面氧化速率进行研究,分析了不同组织、晶粒和温度对铜氧化性能的影响。结果表明:铜的组织结构是影响其氧化性能的主要因素,非密排的(100)晶面上界面能高、晶面原子堆垛相对疏松和原子尺度上粗糙,且氧化膜生长连续,氧化速率高于密排的(111)晶面;温度升高,铜表面的内能增大,铜原子较易成为活化原子与氧气发生反应,同时增大了铜原子在氧化膜中的扩散速率,加速了铜的氧化;铜试样经过等径角挤压(ECAP)后,(111)晶面铜表面的面积增大,氧化速率降低,晶界不是影响铜氧化速率的主要因素,能量较小的晶面原子所占的面积增大,铜的氧化速率减小。

关键词(KeyWords)： 单晶铜;多晶铜;氧化速率;等径角挤压(ECAP)

Abstract:

Keywords:

基金项目(Foundation): 甘肃省科技攻关项目(2GSO64-A52-05)

作者(Author): 曹军,丁雨田,卢振华,胡勇

DOI: 10.13289/j.issn.1009-6264.2011.12.029

参考文献(References)：

• [1]Feng Z,Marks C R,Barkatt A.Oxidation-rate excursions during the oxidation of copper in gaseous environments at moderate temperatures[J].Oxidation of Metals,2003,60(5/6):393-408.
• [2]黄昆,韩汝琪.固体物理学[M].北京,高等教育出版社,1988:67-75.
• [3]罗宇峰,钟澄,张莉,等.纳米铜薄膜氧化反应动力学规律研究[J].化学学报,2007,65(15):1521-1526.LUO Yu-Feng,ZHONG Cheng,ZHANG Li,et al.Investigation for kinetics law of oxidation of a nano-scale copper film[J].Acta Chimica Sinica,2007,65(15):1521-1526.
• [4]Stout J H,Shores D A,Armacanqui M E.Stresses and cracking of oxide scales mater[J].Materials Science and Engineering,A,1989,120:193-197.
• [5]Barnes J J,Goedjen J G,David A Shores.A model for stress generation and relief in oxide-metal systems during a temperature change[J].Oxidation ofMetals,1989,32(5/6):449-469.
• [6]Schutze M.Stresses and decohesion of oxide scales[J].Materials Science and Technology,1988,5:407-414.
• [7]Evans H E,Lobb R C.Conditions for the initiation of oxide-scale cracking and spoliation[J].Corrosion Science,1984,24(3):209-222.
• [8]Rahmel A,Schutze M.Mechanical aspects of the rare-earth effect[J].Oxidation of Metals,1992,38(3/4):255-266.
• [9]Hembree G G,Cowley J M,Otooni M A.The oxidation of copper studied by electron scattering techniques[J].Oxidation of Metals,1979,13(4):331-351.
• [10]Belousov V V.Mechanisms of accelerated oxidation of copper in the presence of molten oxides[J].Oxide Met,2007,67:235-250.
• [11]Fueki K,Wangner J B.Studies of the oxidation of nickel in the temperature range of 900 to 1400[J].Journal of the Electrochemical Society,1965,112(4):384-388.
• [12]Belousov V V.The kinetics and mechanism of catastrophic oxidation of metals[J].Oxidation of Metals,1994,42(5/6):511-528.
• [13]Stroud J E,Tripp W C,Wimmer J M.Defect structure of Ta2O5[J].Journal of the American Ceramic Society,1974,57(4):172-175.

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