李刚,周明,马伟伟,蔡兰

• 1:江苏大学光子制造科学技术中心
• 2:华东交通大学机电工程学院

摘要(Abstract)：

采用K575X高分辨率溅射仪在单晶硅衬底上制备镍纳米催化剂薄膜。研究了高温氨气刻蚀对镍催化剂由连续薄膜转变成纳米颗粒的影响。探讨了预处理时间、温度和催化剂薄膜原始厚度等工艺参数对镍薄膜微结构的影响,得到了镍催化剂薄膜的氨预处理规律,并初步分析了氨气对其形貌变化的影响机理。研究结果表明,获得均匀、细小和高密度过渡镍金属催化剂颗粒的工艺条件是预处理时间、温度和催化剂薄膜原始厚度分别为12min8、00℃和10nm。

关键词(KeyWords)： 氨气刻蚀;溅射;纳米颗粒;硅衬底

Abstract:

Keywords:

基金项目(Foundation): 国家自然科学基金重点资助(50435030)

作者(Author): 李刚,周明,马伟伟,蔡兰

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