魏俊俊,贺琦,高旭辉,吕反修

• 1:北京科技大学材料科学与工程学院

摘要(Abstract)：

采用微波等离子体化学气相沉积(MPCVD)技术在钛基片上沉积了掺硼金刚石薄膜,并对掺杂前后的薄膜形貌及结构进行了检测。结果表明掺杂元素对形貌和结构有很大的影响,同时掺杂后薄膜与基底附着力有所下降。掠角衍射(GIXD)检测表明,中间层的主要成分是TiC和TiH2。随着硼的加入,两者的含量增加。薄膜与基底的附着力下降的原因主要是受中间过渡层成分和残余应力增加的共同影响。

关键词(KeyWords)： 金刚石薄膜;掠角衍射(GIXD);掺硼;附着力;CVD

Abstract:

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基金项目(Foundation):

作者(Author): 魏俊俊,贺琦,高旭辉,吕反修

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