李合琴,都智,储汉奇,聂竹华

• 1:合肥工业大学材料科学与工程学院

摘要(Abstract)：

用磁控溅射法在奥氏体不锈钢基片上制备了SiC单层膜和Ti/TiN双层膜以及Ti/TiN/SiC功能梯度薄膜。采用XRD和显微硬度计对薄膜的结晶质量和硬度进行表征;用AFM和SEM对薄膜的表面和截面形貌进行了表征。结果表明:Ti/TiN双层膜在氩氮流量比为15∶15时,薄膜的结晶质量最好,硬度最高,达到15.6 GPa,最适合作为钢基SiC薄膜的缓冲层。另外,功能梯度SiC薄膜比SiC单层膜的结晶质量好;不同退火温度下功能梯度SiC薄膜的硬度高于SiC单层膜,同时功能梯度SiC薄膜的表面结晶质量也优于SiC单层膜。

关键词(KeyWords)： 奥氏体不锈钢;磁控溅射;SiC单层膜;Ti/TiN双层膜;Ti/TiN/SiC功能梯度薄膜

Abstract:

Keywords:

基金项目(Foundation): 国家“973”计划项目(2008CB717802);; 安徽省自然科学基金(11040606M63);; 安徽省高校自然科学基金(KJ2009A091)

作者(Author): 李合琴,都智,储汉奇,聂竹华

DOI: 10.13289/j.issn.1009-6264.2012.01.028

参考文献(References)：

• [1]邵红红,张晔,高建昌,等.碳钢基体磁控溅射SiC薄膜结合力研究[J].金属热处理,2007,32(2):50-53.SHAO Hong-hong,ZHANG Ye,GAO Jian-chang,et al.Binding force of SiC films prepared by magnetron sputtering on carbon steel[J].HeatTreatment of Metals,2007,32(2):50-53.
• [2]姚振宇.聚变堆包层材料不同涂层的防氚渗透性能测试[D].北京:中国原子能科学研究院,2001.
• [3]Jonsson B,Hogmark S.Hardness measurements of thin films[J].Thin Films,1984,114(3):257-269.
• [4]Chechenin N G,Bottiger J,Krog J P.Nanoindentation of amorphous aluminum oxide films I:The influence of the substrate on the plastic properties J].Thin Solid Films,1995,261(1-2):219-227.
• [5]Pelleg J,Zevin L Z,Lungo S,et al.Reactive-sputter-deposited TiN films on glass substrates[J].Thin Solid Films,1991,197(1-2):117-128.
• [6]Jones M I,Mccoll I R,Grant D M.Effect of substrate preparation and deposition conditions on the preferred orientation of TiN coatings deposited byRF reactive sputtering[J].Surface and Coatings Technology,2000,132(2-3):143-151.
• [7]王庆喜,弥谦,惠迎雪.氮气流量对UBMS制备TiN薄膜结构和力学性能的影响[J].材料导报,2008,22:66-68.WANG Qing-xi,MI Qian,HUI Ying-xue.Influence of nitrogen flux on structure and mechanical properties of TiN films deposited with UBMStechnique[J].Materials Review,2008,22:66-68.
• [8]Li G Y,Lao J J,Tian J W,et al.Coherent growth and mechanical properties of AlN/VN multilayers[J].Journal of Applied Physics,2004,95(1):92-96.
• [9]Kim C,Qadri S B,Scanlon M R,et al.Low-dimension structural properties and microindentation studies of ion-beam-sputtered multilayers of Ag/Alfilms[J].Thin Solid Films,1994,240(1-2):52-55.
• [10]劳技军,孔明,张慧娟,等.TiN/SiC纳米多层膜的生长结构与力学性能[J].物理学报,2004,53(6):1962-1966.LAO Ji-jun,KONG Ming,ZHANG Hui-juan,et al.Growth structure and mechanical properties of TiN/SiC nano-multilayers[J].Acta Physica Sinica,2004,53(6):1962-1966.
• [11]Li D,Lin X W,Cheng S C.Structure and hardness studies of CNx/TiN nanocomposite coatings[J].Applied Physics Letters,1996,68(9):1211-1213.
• [12]李戈扬,劳技军,田家万,等.AlN/VN纳米多层膜的共格生长与超硬效应[J].机械工程学报,2004,40(12):56-59.LI Ge-yang,LAO Ji-jun,TIAN Jia-wang,et al.Coherent growth and superhardness effect of AlN/VN nanomultilayers[J].Chinese Journal ofMechanical Engineering,2004,40(12):56-59.

文章评论(Comment)：