高质量自支撑CVD金刚石膜的氧化行为Oxidation behavior of high quality freestanding diamond films
刘敬明,吕反修
摘要(Abstract):
研究了气体循环模式下的直流等离子体喷射CVD自支撑高质量金刚石厚膜高温氧化行为。结果表明,金刚石膜在大约650℃开始氧化,氧化速度随着温度的升高而快速增加;高温氧化将导致金刚石膜的力学、光学和热学性能的下降,多晶金刚石膜晶界的优先氧化损伤是造成其综合性能下降的主要原因。高质量的自支撑金刚石膜不适合在空气中700℃以上长时间工作,但在800℃以下短时间(3min内)工作是安全的。
关键词(KeyWords): 氧化;高质量自支撑金刚石膜;直流电弧等离子体喷射
基金项目(Foundation): 国家先进材料委员会项目(2002AA305508);; 北京市自然科学基金(SZR051);; 北京市科技新星计划项目(XX055)
作者(Author): 刘敬明,吕反修
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