Up-scaled Teer-UDP850/4 Unbalanced Magnetron Deposition System Used for Mass-Production of CrTiAIN Hard CoatingsUp-scaled Teer-UDP850/4 Unbalanced Magnetron Deposition System Used for Mass-Production of CrTiAIN Hard Coatings
TEER D.G
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作者(Author): TEER D.G
参考文献(References)：
- 1Yang S,Li X and Teer D G Properties and Performance of Crtialn Multilayer Hard Coatings Deposited Using Magnetron Sputter Ion Plating.Surface Engineering,2002,18(5):391-396
- 2.Hans M,Buchel R,Grischke M,Hobi R and Zach M.High-Volume PVD Coating of Precision Components of Large Volumes at Low Process Costs.Surface and Coating Technology,2000,123(2):288-293
- 3Teer D G.UK Patent225843A
- 4Terwagne G and Bodart F.Aluminum and Silicon Determination on Two Si-Al Sputter Targets Used For Magnetron Sputtering.Nuclear Instruments and Methods in Physics Research B,1999,158(3)683-688
- 5Rossnagel S M,Yang I and Cuomo J J.Compositional Changes During Magnetron Sputtering of Alloys.Thin Solid Film,1991,199(1):59-69
- 6Wang Zhenxia,Pan Jisheng,Zhang Jiping and Tao Zhenlan.Locally Rich Element and Preferential Sputtering of Alloys.Nuclear Instruments and Methods in Physics Research B,1993,74(3):380-384
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