吴玉程

• 1:太原理工大学新材料界面科学与工程教育部重点实验室
• 2:合肥工业大学有色金属材料与加工国家地方联合工程研究中心

摘要(Abstract)：

金刚石薄膜由于具有良好的耐磨性能以及极高的硬度,其制备与应用受到研究者广泛关注。目前,金刚石的制备方法总体分为两个部分,其一为高温高压法,另一个则为化学气相沉积法。而目前金刚石薄膜所面临的重大问题是镀膜过程中生长速度较慢,不利于批量生产,另一方面薄膜与基板的附着力较差,其摩擦系数在恶劣的工业环境中较大,这些问题亟待研究解决。本文综述了国内外有关金刚石薄膜化学气相沉积法的各种制备方法,重点讨论了采用热丝化学气相沉积法以及微波化学气相沉积法制备金刚石薄膜的研究现状,并论述了金刚石薄膜的应用优势以及未来金刚石薄膜的制备以及应用的方向和前景。

关键词(KeyWords)： 金刚石薄膜;HFCVD;MPCVD;DC Plasma Jet CVD;应用

Abstract:

Keywords:

基金项目(Foundation): 国家“双一流”学科建设高校项目(SC17100153);; 山西省“1331工程”学科建设项目(SC18100292)

作者(Author): 吴玉程

DOI: 10.13289/j.issn.1009-6264.2018-0411

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