三种不同沉积工艺制备CrAlN涂层的性能Properties of CrAlN coatings prepared by three different deposition processes
王新太,王进,金烨堂,顾宁,孙树峰
摘要(Abstract):
采用阴极多弧离子镀膜技术,制备了3种不同沉积工艺的CrAlN涂层。利用扫描电镜(SEM)、X射线衍射(XRD)、工具显微镜、球痕仪、洛式硬度计、HV显微硬度计、电化学工作站等研究了涂层的显微形貌、力学性能和耐腐蚀性。结果表明:采用氩离子刻蚀工艺沉积Cr N打底层的CrAlN涂层表面质量改善明显,厚度均匀波动小,硬度高,膜基结合力强,摩擦系数小,排屑能力强,以及具有较高的耐腐蚀性。
关键词(KeyWords): CrAlN涂层;阴极多弧离子镀;沉积工艺;涂层性能
基金项目(Foundation): 山东省重点研发计划项目(2019GGX102023);; 国家自然科学基金(51205217,,51775289)
作者(Author): 王新太,王进,金烨堂,顾宁,孙树峰
DOI: 10.13289/j.issn.1009-6264.2019-0175
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