窦志昂,占勤,杨洪广

• 1:中国原子能科学研究院

摘要(Abstract)：

采用辉光放电发射光谱(GDOES)测试分析方法研究了磁控溅射功率、工作气压、基片温度等工艺参数对钛膜厚度、密度、扩散层的影响。结果表明,在0.2 Pa工作气压条件下,在100～300 W范围内溅射功率与沉积速率呈近似线性关系;在溅射功率200 W条件下,工作气压在0.2～0.7 Pa范围内的沉积速率较为稳定,约为16 nm/min,而增大工作气压将显著降低钛膜密度,工作气压0.2 Pa对应的钛膜密度达到4.47 g/cm~3,而0.7 Pa对应的钛膜密度仅为3.26 g/cm~3;基片温度显著影响了钛膜与钼基片之间的扩散层厚度,在溅射功率200 W、工作气压0.2 Pa条件下镀膜300 min,基片温度100℃下的扩散层厚度为487 nm,250℃下则达到814 nm。

关键词(KeyWords)： 磁控溅射;钛膜;密度;扩散层;辉光放电发射光谱(GDOES)

Abstract:

Keywords:

基金项目(Foundation): 科技部中子管项目(2017YFF0104201);; 中核集团自主研发项目

作者(Author): 窦志昂,占勤,杨洪广

DOI: 10.13289/j.issn.1009-6264.2020-0192

参考文献(References)：

• [1] 宋应民,杨洪广,张家善,等.高性能密封氘氚中子管研制[J].中国原子能科学研究院年报,2013(1):161-162.SONG Ying-min,YANG Hong-guang,ZHANG Jia-shan,et al.Development of high performance sealed deuterium and tritium neutron tube[J].Annual Report of China Institute of Atomic Energy,2013(1):161-162.
• [2] 宋应民,杨洪广,张家善,等.用于中子测井的自成靶密封中子管性能评价[J].同位素,2014,27(4):199-202.SONG Ying-min,YANG Hong-guang,ZHANG Jia-shan,et al.The parameters test of a tealed D-T logging neutron tube[J].Journal of Isotopes,2014,27(4):199-202.
• [3] 郤方华,王志全,陈路,等.靶膜对中子管中子产额的影响分析[J].测井技术,2013(1):32-34.YU Fang-hua,WANG Zhi-quan,CHEN Lu,et al.The influence of target film properties on the yield of neutron tube[J].Well Logging Technology,2013(1):32-34.
• [4] 景士伟,高杨,张照旭,等.靶钛膜处理对氘-氘及氘-氚中子管性能的影响[J].东北师大学报:自然科学版,2013,45(1):84-87.JING Shi-wei,GAO Yang,ZHANG Zhao-xu,et al.Impact of target treatment on properties of D-D or D-T neutron tube[J].Journal of Northeast Normal University(Natural Science Edition),2013,45(1):84-87.
• [5] 张文峰,刘实,王隆保,等.直流磁控溅射钛及钛合金薄膜的性能研究[J].原子能科学技术,2008,42(10):933-937.ZHANG Wen-feng,LIU Shi,WANG Long-bao,et al.Properties of Ti and Ti-alloy film deposited by direct current magnetron sputtering[J].Atomic Energy Science and Technology,2008,42(10):933-937.
• [6] Ehiasarian A P,New R,Hovsepian P E,et al.Influence of pressure and power on the composition and time evolution of plasmas in High Power Impulse Magnetron Sputtering[C]//SVC 47.2004.
• [7] Bendavid A,Martin P J,Smith G B,et al.The mechanical and structural properties of Ti films prepared by filtered arc deposition[J].Vacuum,1996,47(10):1179-1188.
• [8] 吴杨微,郑明志,林丽梅,等.磁控溅射制备钛薄膜的结构和光学性质[J].福建师范大学学报:自然科学版,2012,28(4):31-35.WU Yang-wei,ZHENG Ming-zhi,LIN Li-mei,et al.Structural and optical properties of titanium films prepared by magnetron sputtering[J].Journal of Fujian Normal University(Natural Science Edition),2012,28(4):31-35.
• [9] Ma Y L,Shi J,Li X C,et al.Effect of substrate temperature on the structure and optical properties of the Ta2O5 thin film[J].Journal of Functional Materials,2013,44(23):3405-3407.
• [10] 李磊.面心立方结构钛膜的相变[J].中国有色金属学报,2015,23(z1):253-256.LI Lei.Phase transform of FCC-Ti films[J].The Chinese Journal of Nonferrous Metals,2015,23(z1):253-256.
• [11] 郭炜,杨洪广.磁控溅射钛膜GDOES分析方法[J].电子世界,2019(11):37-38.GUO Wei,YANG Hong-guang.GDOES analysis method of titanium film by magnetron sputtering[J].Electronics World,2019(11):37-38.
• [12] Martin N,Baretti D,Rousselot C,et al.The effect of bias power on some properties of titanium and titanium oxide films prepared by r.f.magnetron sputtering[J].Surface and Coatings Technology,1998,107(2/3):172-182.
• [13] Jeyachandran Y L,Karunagaran B,Narayandass Sa K,et al.The effect of thickness on the properties of titanium films deposited by dc magnetron sputtering[J].Materials Science and Engineering A,2007,458(1/2):361-365.
• [14] 李丽,吴卫,金永中,等.磁控溅射钛膜的沉积过程及表面形貌研究[J].西华大学学报,2009,28(2):92-95.LI Li,WU Wei,JIN Yong-zhong,et al.Research on forming process and surface topography of Ti thin film deposited by magnetron sputtering[J].Journal of Xihua University,2009,28(2):92-95.
• [15] 李丽,吴卫,金永中,等.磁控溅射中工作压强对钛膜沉积的影响[J].表面技术,2009,38(1):64-65.LI Li,WU Wei,JIN Yong-zhong,et al.Effect of working pressure on Ti thin film deposited by magnetron sputtering[J].Surface Technology,2009,38(1):64-66.

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