偏压对CrTiAlN镀层组织形貌及磨损性能的影响Influence of bias voltage on morphology,phase and wear performance of magnetron sputtered CrTiAlN coatings
白力静,张国君,蒋百灵
摘要(Abstract):
利用闭合场非平衡磁控溅射离子镀技术制备了耐磨CrTiAlN镀层,分析了溅射偏压对该镀层的形貌、相结构以及磨损性能的影响。研究表明:偏压对镀层的形貌、相结构以及与摩擦学性能有关的摩擦系数、硬度、结合力以及磨损率等参数都有影响。在制备CrTiAlN镀层的过程中,当偏压为-75V时镀层的耐磨损性最好,当偏压在-65V--85V变化时,镀层形貌的变化对镀层的磨损性能无明显影响,CrTiAlN镀层相结构的变化是影响磨损性能的主要原因。
关键词(KeyWords): 偏压;CrTiAlN镀层;形貌;相;磨损性能
基金项目(Foundation): 国家863计划(2005AA33H010)
作者(Author): 白力静,张国君,蒋百灵
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