磁控溅射和退火制备ZnO/SiO2复合薄膜ZnO/SiO2 composite films prepared by magnetron sputtering and annealing
程晓蕾,刘志,施焕儒,简建明,徐杨
摘要(Abstract):
采用射频磁控溅射和退火处理的方法在单晶硅衬底上制备了ZnO/SiO2复合薄膜,利用X射线衍射(XRD)、扫描电镜(SEM)、能谱分析(EDS)和接触角测量等测试手段研究溅射气压、溅射功率、氧氩比和退火温度等对复合薄膜成分组成、组织结构及润湿性能的影响。研究表明,复合薄膜中主要有ZnO、SiO2、Zn2SiO4 3种物相,且分别以六方纤锌矿结构、无定形态和硅锌矿型等形式存在。随着溅射和退火工艺的改变,复合薄膜的接触角在41°~146°间变化,组织形态由颗粒状向纳米竹叶状变化。溅射气压0.5 Pa,溅射功率120 W,氧氩比(O2∶Ar)为0∶30,退火温度为700℃的条件下获得具有六方纤锌矿结构的ZnO纳米组织,该组织呈现出竹叶状,在薄膜表面交错排列形成了无序多空隙的微观形貌,使复合薄膜具有超疏水性,接触角为146°。
关键词(KeyWords): 磁控溅射;退火;ZnO/SiO2;复合薄膜;润湿性
基金项目(Foundation): 国家十二五科技支撑项目(2011BAD20B01);; 公益性行业(农业)科研专项(201003009)
作者(Author): 程晓蕾,刘志,施焕儒,简建明,徐杨
DOI: 10.13289/j.issn.1009-6264.2012.01.001
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