喻利花,薛安俊,董松涛,许俊华

• 1:江苏科技大学材料科学与工程学院江苏省先进焊接技术重点实验室

摘要(Abstract)：

采用多靶反应磁控溅射技术制备了一系列不同Si含量的Ti-Al-Si-N复合膜。采用能谱仪、X射线衍射仪、三维轮廓仪、原子力显微镜和显微硬度仪对薄膜进行表征,研究了Si含量对Ti-Al-Si-N复合膜微结构和力学性能的影响。结果表明:用Ti0.33 Al0.67合金靶制备的Ti-Al-N复合膜呈双相共存结构(fcc+hcp),Si的加入,促进了六方相的生长,细化了晶粒,降低了表面粗糙度。随着Si含量的增加,Ti-Al-Si-N复合膜的硬度逐渐增大,在Si含量为16.69 at%时,达到最大硬度32.3 GPa,继续增加Si含量,薄膜硬度降低。

关键词(KeyWords)： Ti-Al-Si-N;磁控溅射;微结构;显微硬度

Abstract:

Keywords:

基金项目(Foundation): 国家自然科学基金(50574044);; 江苏省自然科学基金(BK2008240)

作者(Author): 喻利花,薛安俊,董松涛,许俊华

DOI: 10.13289/j.issn.1009-6264.2010.07.008

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