Preparation and Anti-Oxidation Properties of Ti(CN) Films Deposited by P CVDPreparation and Anti-Oxidation Properties of Ti(CN) Films Deposited by P CVD
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参考文献(References)：
- 1Aral T,Fujita H,Oguri K.Plasma-assisted chemical vapour deposition of TiN and TiC on steel:Properties of coatings.J.Thin Solid Films,1988,165:139-148.
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- 3.Hahn B H,Jun J H,Joo J H.Plasma conditions for the deposition of TiN by biased assisted reactive evaporation and dependence of the resistivity on preferred orientation.The14th International Conference on Metallurgical Coatings,San Diego,CA,U.S.A.,1987.
- 4.Igasaki Y,Mitsuhashi H.The effects of substrate bias on the structural and electrical properties of TiN films prepared by re-active R.F.sputting.J.Thin Solid Films,1980,70:17-24.
- 5.Kim C W,Kim K H.Anti-oxidation properties of TiAIN film prepared by plasma-assisted chemical vapor deposition and roles of Al.J.Thin Solid Films.1997,307:113-119.
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