董松涛,喻利花,薛安俊,许俊华

• 1:江苏科技大学材料科学与工程学院
• 2:江苏省先进焊接技术重点实验室

摘要(Abstract)：

采用射频磁控溅射方法制备了单层TiAlN、CrAlN复合薄膜以及不同调制周期和不同层厚比(lTiAlN/lCrAlN)的TiAlN/CrAlN纳米结构多层膜。薄膜采用X射线衍射仪、扫描电子显微镜、显微硬度仪进行表征。结果表明:TiAlN、CrAlN复合薄膜和TiAlN/CrAlN多层膜均为面心立方结构,呈(111)面择优取向。TiAlN/CrAlN多层膜的择优取向与调制周期和层厚比无关。层厚比为1的TiAlN/CrAlN多层膜的硬度依赖于调制周期,在调制周期为8nm时,达到最大;固定TiAlN的厚度为4nm,改变CrAlN层的厚度,在研究范围内,多层膜的硬度随着CrAlN层厚度的增加而增加。探讨了多层膜的致硬机制。TiAlN/CrAlN多层膜抗氧化温度比其组成单层膜高了近200℃,并讨论了其抗氧化机制。

关键词(KeyWords)： TiAlN/CrAlN纳米多层膜;显微硬度;微结构;抗氧化性能

Abstract:

Keywords:

基金项目(Foundation): 国家自然科学基金(50574044);; 江苏省自然科学基金(BK2008240)

作者(Author): 董松涛,喻利花,薛安俊,许俊华

DOI: 10.13289/j.issn.1009-6264.2010.08.024

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