任飞桐,杨志亮,任国钊,刘宇晨,解承东,陈良贤,刘金龙,魏俊俊,李成明

• 1:北京科技大学新材料技术研究院
• 2:江苏第三代半导体研究院

摘要(Abstract)：

金刚石集超硬特性、极高热导率、宽光谱透光性和高载流子迁移率等优异性能于一身，在力学、热学、光学与电学领域具有广阔应用前景。在多种化学气相沉积(Chemical vapor deposition, CVD)制备方法中，微波等离子体CVD(Microwave plasma chemical vapor deposition, MPCVD)因能实现无污染和均匀稳定的等离子体，被视作合成高质量、大面积金刚石最具潜力的技术路径。本文系统梳理了MPCVD装置的工作原理与发展历程，综述了其在单晶与多晶金刚石制备方面的技术进展，并探讨了金刚石材料在多个领域中的应用现状，以期为相关研究与发展提供参考。

关键词(KeyWords)： 微波等离子体化学气相沉积;金刚石薄膜;金刚石制备装置

Abstract:

Keywords:

基金项目(Foundation):

作者(Author): 任飞桐,杨志亮,任国钊,刘宇晨,解承东,陈良贤,刘金龙,魏俊俊,李成明

DOI: 10.13289/j.issn.1009-6264.2025-0388

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