磁控溅射法制备Cu2ZnSnS4薄膜及其性能表征Fabrication and characterization of Cu2ZnSnS4 thin films prepared by magnetron sputtering
华中,孟祥成,孙亚明,于万秋,龙东,张守琪
摘要(Abstract):
利用磁控溅射法将Cu/Sn/Zn S前驱体沉积在钙钠玻璃基片上,再通过硫化该前驱体制备Cu2ZnSnS4薄膜。利用X射线衍射仪、拉曼光谱仪、扫描电子显微镜、能谱仪、霍尔效应测量系统和紫外可见分光光度计研究了Cu2ZnSnS4薄膜的微观结构、表面形貌、化学成分、电学和光学性能。结果表明,CZTS薄膜的微观结构依赖于硫化温度和时间。在480℃硫化3 h的薄膜为沿(112)晶面择优取向生长的纯相CZTS薄膜,该薄膜的禁带宽度是1.51 e V,其电阻率和载流子浓度分别为0.39Ω·cm和4.07×1017cm-3。
关键词(KeyWords): Cu2ZnSnS4;磁控溅射;硫化;薄膜
基金项目(Foundation): 吉林师范大学研究生创新研究计划(2013005)
作者(Author): 华中,孟祥成,孙亚明,于万秋,龙东,张守琪
DOI: 10.13289/j.issn.1009-6264.2015.06.039
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