铝合金等离子体基离子注入氮/钛结构及摩擦学特性The Structure and Tribological Characteristic for Aluminum Alloy Implanted with N/Ti by PBII
廖家轩,夏立芳,孙跃
摘要(Abstract):
通过X射线光电子能谱 (XPS)和小掠射角X射线衍射 (GXRD)分析测定了铝合金LY12等离子体基离子注入氮再注入钛的改性层成分分布及相组成。测量了纳米硬度 ,进行了摩擦磨损试验及磨痕形貌观察。讨论了磁控靶溅射电流 40mA、40 0mA对改性层结构和摩擦学性能的影响。结果表明 ,氮在注入层呈高斯分布 ,钛沿注入方向逐渐减少 ,钛的注入使氮的分布展宽 ,在 40 0mA下注钛有钛的沉积层出现。和LY12相比 ,摩擦学性能显著提高 ,粘着磨损程度显著减轻 ,40 0mA下改善幅度更大 ,形成TiO2 、TiN、TiAl3、Al2 O3、AlN或Ti相是主要原因
关键词(KeyWords): 铝合金;等离子体基离子注入(PBII);纳米硬度;摩擦学;粘着磨损
基金项目(Foundation): 国家自然科学基金资助 !(59771 0 59)
作者(Author): 廖家轩,夏立芳,孙跃
参考文献(References):
- 1 GuzmanL ,BoniniG ,AdamiM ,etal.Mechanicalbehaviourofnitrogen implantedaluminumalloys[J] .SurfCoatTechnol,1 996 ,83 :2 84.
- 2 LucasS ,ChevallierJ.Nanohardnessandtransmissionelectronmicroscopystudyofnitrogen implantedaluminum[J] .SurfCoatTechnol,1 994,65 :1 2 8.
- 3 XiaLifang ,WangRizhi,MaXinxin ,etal.Structureandwearbehaviorofnitrogen implantedaluminumalloys[J] .JVacSciTechnol,1 994,B1 2 (2 ) :931 .
- 4 MadaksonPeterB .Effectofimplantationdoseonthehardness,frictionandwearofSbimplantedAl[J] .JApplPhys 1 984,55(9) :330 8.
- 5 ConradJR ,RadtkeJL ,DoddRA ,etal.Plasmasourceion implantationtechniqueforsurfacemodificationofmaterials[J] .JApplPhys,1 987,62 (1 1 ) :4591 .
- 6 夏立芳 .金属等离子体源离子注入方法和装置 [P] .中国专刊 :CNZL92 1 1 371 76 ,1 992 .
- 7 WalterKC .Nitrogenplasmasourceionimplantationofaluminum[J] .JVacSciTechnol,1 994,B1 2 (2 ) :945 .
- 8 G櫣nzelR ,WieserE ,RichterE ,etal.Plasmasourceionimplantationofoxygenandnitrogeninaluminum [J] .JVacSciTechnol,1 994,B1 2 (2 ) :92 7.
- 9 ZhanZaiji,MaXinxin ,SunYue ,XiaLifang ,etal.Themechanicalpropertiesofanaluminumalloybyplasma basedionimplantationandsolution agingtreatment [J] .SurfCoatTechnol,2 0 0 0 ,1 2 8~ 1 2 9:2 56 .
- 1 0 YuWeidong ,XiaLifang,etal.MetalplasmasourceionimplantationusingaUBMcathode[J] .SurfCoatTechnol,2 0 0 0 ,1 2 8~ 1 2 9:2 4 0 .
- 1 1 MoulderJF ,StickleWF ,SobolPE ,etal.HandbookofX rayPhotoelectronSpectroscopy [M] .Minnesota :PhysicalElectronics,Inc.Press,1 995 .
- 1 2 KestwoodAD ,NotisMR .Ceramicsubstratesandpackagesforelectronicapplications[J] .AdvanceinCeramics,1 992 ,2 6 :1 71 .
- 1 3 HeXiangjun ,YangSize,TaoKun ,etal.InvestigationoftheinterfacereactionsofTithinfilmswithAlNSubstrate[J] .JMaterRes ,1 997,1 2 (3) : .
- 1 4 WittlingM ,BendavidA ,MartinPJ ,etal.Influenceofthicknessandsubstrateonthehardnessanddeformationofthinfilms[J] .ThinSolidFilms ,1 995 ,2 70 :2 83
- 15 LucasS ,TerwagneG ,BodartF .Temperatureanddosedependenceofnitrogenimplantationintoaluminum[J] .NuclInstrumMeth ,1 990 ,B50 :40 1
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