Ti-Nb-Si基高温合金表面包埋Si-Cr共渗涂层的组织Microstructure of Si-Cr co-deposition coatings on a Ti-Nb-Si based high temperature alloy by pack cementation process
乔彦强,郭喜平
摘要(Abstract):
采用Si-Cr包埋共渗法在Ti-Nb-Si基高温合金表面制备了Cr改性的硅化物涂层,共渗温度为1250和1300℃,时间为10h。利用SEM,EDS和XRD等检测手段分析了涂层的结构、元素分布及相组成等,并对涂层的形成机理进行了讨论。结果表明:Si-Cr共渗温度为1250℃时,降低渗剂中的催化剂NaF含量会降低Si和Cr的反应扩散速度并且改变了涂层的结构和相组成。催化剂NaF含量为8wt%,涂层外层由(Nb,Ti)Si2及少量(Ti,X)5Si3(X代表Nb,Cr和Hf等元素)组成,中间层由(Ti,X)5Si4组成,过渡层由(Nb,Ti)5Si3组成;降低NaF含量至5wt%,Si-Cr共渗温度仍为1250℃时,涂层外层由(Ti,X)5Si3组成,且有较多孔洞出现,中间层为(Ti,X)5Si4,而过渡层很薄。与渗Si涂层相比,Si-Cr共渗涂层中的裂纹明显减少,但在涂层外层存在较多孔洞且涂层厚度明显减小。提高包埋共渗温度至1300℃时,Cr的反应扩散速度得到提高,且在涂层外层出现了(Nb1.95Cr1.05)Cr2Si3三元相。
关键词(KeyWords): Ti-Nb-Si基高温合金;包埋渗;Si-Cr共渗;涂层形成机理
基金项目(Foundation): 国家自然科学基金项目(50871087)
作者(Author): 乔彦强,郭喜平
DOI: 10.13289/j.issn.1009-6264.2010.03.020
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