Characterization of ZrO2 Films Deposited by Reactive Unbalanced Magnetron SputteringCharacterization of ZrO2 Films Deposited by Reactive Unbalanced Magnetron Sputtering
摘要(Abstract)：
关键词(KeyWords)：
基金项目(Foundation):
作者(Author):
参考文献(References)：
- 1Teixeira V,Monteiro A,Duarte J,et al.Deposition of Composite and Nanolaminate Ceramic Coatings by Sputtering.Vacuum,2002,67(3-4):477-483
- 2De Vicente F S,De Castro A C,et al.Luminescence and Structure of Er3*Doped Zirconia Films Deposited by Electron Beam Evaporation.Thin Solid Films,2020,418(2):222-227
- 3Koch T,Ziemann P,et al.Effects of lon-beam-assisted Deposition on theGrowth of Zirconia Films.Thin Solid Films,1997,303(1-2):122-127
- 4Moulzolf S C,Yu Y,et al.Properties of ZrO2Films on Sapphire Prepared by Electron Cyclotron Resonance Oxygen-plasma-assisted deposition.J.Vac.Sci.Technol.A,1997,15(3):1211-1214
- 5Husmann A,Gottmann J,Klotzbiicher T,et al.Pulsed Laser Deposition of Ceramic Thin Films Using Different Laser Sources.Surf,and Coat.Technol.,1998,100/101(1-3):411-414
- 6Pengtao G,Meng L J,Dos Santos M P,et al.Influence of Sputtering Pressure on the Structure and Properties of ZrO2Films Prepared by RF Reactive Sputtering.Applied Surface Science,2001,173(1-2):84-90
- 7Koski K,Holsa J,Juliet P.Properties of Zirconium Oxide Thin Films Deposited by Pulsed Reactive Magnetron Sputtering.Surface and Coatings Technology,1999,120-121:303-312
- 8Svadkovski I V,Golosov D A,Zavatskiy S M.Characterisation Parameters for Unbalanced Magenetron Sputtering Systems.Vacuum,2003,68(4):283-290
- 9Bland R D,Kominiak G J,Mattox D M.Effect of Ion Bombardment during Deposition on Thick Metal and Ceramic Deposits.J.Vac.Sci.Tecnol.,1974,11(4):671-674
- 10Ben Amor S,Rogier B,Baud G,et al.Characterization of Zirconia Films Deposited by R.F.Magnetron Sputtering.Mate.Sci.Eng.B,1998,57(1):28-39
- 11Kuo D H and Chien C H.Growth and Properties of Sputtered Zirconia and Zirconia-silica Thin Films.Thin Solid Films,2003,429(1-2):40-45
文章评论(Comment)：
|
||||||||||||||||||
|
||||||||||||||||||