文晓斌,李显,梁戈,蒋百灵

• 1:西安理工大学材料科学与工程学院

摘要(Abstract)：

采用直流磁控溅射方法于不同磁控管非平衡度状态下,通过单靶溅射模式在单晶Si衬底上制备了Cr膜。利用AFM、SEM、四探针测试仪及MTS Nano Indenter XP纳米压入测量仪分别对两种磁控管非平衡状态下所得Cr膜的微观形貌、电阻率、纳米硬度和抗磨损性进行了观察和分析,研究了不同磁控管非平衡状态下Cr膜微观结构与性能之间的关系。结果表明:磁控管非平衡状态显著影响着Cr膜的微观结构及性能。不同非平衡度状态下,镀层晶体均为沿Cr(110)择优生长的柱状晶组织。同一靶基距处,镀层晶粒尺寸及硬度与非平衡度大小成正比,而电阻率及抗磨损性能变化趋势却相反。靶基距亦为影响镀层微观结构和性能的重要因素之一。

关键词(KeyWords)： 磁控管非平衡度;微观形貌;纳米硬度;抗磨损性

Abstract:

Keywords:

基金项目(Foundation): 国家“863”科技攻关基金资助项目(2005AA33H010)

作者(Author): 文晓斌,李显,梁戈,蒋百灵

DOI: 10.13289/j.issn.1009-6264.2010.10.030

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