分子动力学分析Cu/Al2Cu/Al体系的扩散过程Diffusion process of Cu/Al2Cu/Al system analyzed by molecular dynamics
崔云峰,王文焱,谢敬佩,王爱琴,毛志平,高铭
摘要(Abstract):
基于分子动力学方法,对Cu/Al_2Cu/Al体系界面扩散过程进行了模拟研究。探讨了不同保温温度对Cu/Al_2Cu界面及Al/Al_2Cu界面扩散的影响,通过原子的均方位移和扩散系数对界面处原子的扩散行为进行分析,并通过径向分布函数和原子沿Z轴浓度分布对界面演变进行分析。结果表明:在Cu/Al_2Cu界面处,Cu原子能够深入扩散到Al_2Cu内部,而Al_2Cu在933 K及以上时才能在界面附近向Cu侧扩散。界面处过渡层的厚度随着保温温度的升高而增加,且过渡层逐渐向两侧扩展。在Al/Al_2Cu界面处,Al原子与Al_2Cu相互扩散的现象非常明显,Al层在扩散过程中有序结构被破坏,呈现出混乱的状态;Cu层能够保持较高的有序性,但在933 K及以上时,Cu层结构有序性逐渐被破坏,且界面附近Cu层原子的结构相较于纯Cu层更为混乱。
关键词(KeyWords): 分子动力学;Cu;Al;Al_2Cu;界面扩散
基金项目(Foundation): 国家重点研发计划(2021YFB3701305)
作者(Author): 崔云峰,王文焱,谢敬佩,王爱琴,毛志平,高铭
DOI: 10.13289/j.issn.1009-6264.2023-0136
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