HIPIMS技术制备CrN及CrAlN涂层的性能Properties of CrN and CrAlN coatings prepared by HIPIMS technology
朱宇杰,马景灵,王广欣,秦聪慧,Heinz Rolf Stock
摘要(Abstract):
用高能脉冲靶和双极脉冲靶共溅射的方式,采用高功率脉冲磁控溅射技术(HIPIMS)在高速钢基片(W18Cr4V)上制备了CrN涂层和CrAlN涂层((H+B)CrN、(H+B)CrAlN);同时采用第四代电弧离子镀技术(ARC evaporators)在高速钢基片上制备了CrN涂层和CrAlN涂层(ARC CrN、ARC CrAlN)。采用划痕试验、X射线衍射、扫描电镜和电化学腐蚀测试等研究了涂层的形貌和性能。结果表明:共溅射制备的涂层膜基结合力更强,临界载荷最高可达到72.2 N,表面晶粒更细小,缺陷少,横截面组织致密;同时该方法制备的CrAlN((H+B)CrAlN)涂层的高温抗氧化性能最佳;共溅射制备的涂层的耐腐蚀性能比电弧离子镀制备的涂层更好。
关键词(KeyWords): 高功率脉冲磁控溅射技术(HIPIMS);共溅射;CrN;CrAlN;膜基结合力;耐腐蚀性
基金项目(Foundation): 河南省自然科学基金培育项目(162300410087)
作者(Author): 朱宇杰,马景灵,王广欣,秦聪慧,Heinz Rolf Stock
DOI: 10.13289/j.issn.1009-6264.2018-0480
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