金刚石自支撑膜衬底生长立方Y2O3薄膜的性能Performance of cubic Y2O3 films deposited on freestanding CVD diamond substrate
王猛,李成明,陈良贤,刘金龙,郭建超,魏俊俊,黑立富,吕反修
摘要(Abstract):
采用射频磁控溅射法在抛光的CVD金刚石膜上制备了立方(222)择优取向的Y2O3薄膜,利用XRD,纳米力学探针,划痕仪,FTIR和TEM等手段研究了退火对Y2O3薄膜的结构、力学性能和红外透过率的影响及Y2O3的微观结构。结果表明:通过退火Y2O3薄膜的结晶程度增加,退火后的择优取向仍为立方相(222)晶面结构;薄膜的硬度降低而弹性模量升高,薄膜与金刚石的结合力增加;薄膜的红外透过率略有降低;薄膜为柱状晶结构并存在大量非晶态。
关键词(KeyWords): CVD金刚石;Y2O3;退火;力学性能;红外透过
基金项目(Foundation): 国家自然科学基金(51272042);; 教育部博士点基金(2011000110011)
作者(Author): 王猛,李成明,陈良贤,刘金龙,郭建超,魏俊俊,黑立富,吕反修
DOI: 10.13289/j.issn.1009-6264.2014.07.032
参考文献(References):
- [1]Harris D C.Frontiers in infrared window and dome materials[J].Proceedings of SPlE-The International Society for Optical Engineering,1995,2552(1):325-335.
- [2]Ravi K V.High-rate synthesis of high-quality diamond for IR optics[J].Proceedings of SPIE-The International Society for Optical Engineering,1994,2286(1):174-185.
- [3]Willingham C B,Hartnett T M,Miller R P,et al.Bulk diamond for IR/RF windows and domes[J].Proceedings of the SPIE-The International Society for Optical Engineering,1997,3060(1):160-168.
- [4]吕反修,唐伟忠,李成明,等.大面积光学级金刚石自支撑膜研究进展[J].红外技术,2003,25(4):1-7.LFan-xiu,TANG Wei-zhong,LI Cheng-ming,et al.Progress on the R&D for large area optical grade freestanding diamond films[J].Infra-red Technique,2003,25(4):1-7.
- [5]Hickey C F,De Rosa J,Snail K A.Scattering and absorption of CVD diamond windows[J].Proceedings of SPIE-The International Society for Optical Engineering,1992,1760(1):154-165.
- [6]Mollart T P,Lewis K L,Wort C J K,et al.Coating technology for CVD diamond optics[J].Proceedings of SPIE-The International Society for Optical Engineering,2001,4375(1):199-205.
- [7]Mollart T P,Wort C J H,Pickles C S.CVD diamond optical components multispectral properties and performance at elevated temperatures[J].Proceedings of SPIE-The International Society for Optical Engineering,2001,4375(1):180-198.
- [8]Hao J H,Studenikin S A,Cocivera M.Blue,green and red cathode luminescence of Y2O3phosphor films prepared by spray pyrolysis[J].Journal of Luminescence,2001,93(4):313-319.
- [9]Husson E,Proust C,Gillet P,et al.Phase transitions in yttrium oxide at high pressure studied by Raman spectroscopy[J].Materials Research Bulletin,1999,34(12):2085-2092.
- [10]Evangelou E K,Wiemer C,Fanciulli M.Electrical and structural characteristics of yttrium oxide films deposited by RF magnetron sputtering on n-Si[J].Applied Physics,2003,94(1):318-325.
- [11]Robert S Johnson,Gerald lucovsky,Joon Cao Hong.Fixed charge and interface traps at heterovalent interfaces between Si(100)and non-crystalline A12O3-Ta2O5alloys[J].Microelectronic Engineering,2002,190(1):43-47.
- [12]Assouar M B,Hakiki M E,Elmazria O,et al.Synthesis and microstructural characterisation of reactive RF magnetron sputtering AlN films for surface acoustic wave filters[J].J Diamond and Related Materials,2004,13(4-8):1111-1115.
- [13]Gaboriaud R J,Pailloux F,Pacaud J,et al.Microstructural investigations of Y2O3thin films deposited by laser ablation on MgO[J].Applied Physics A,2000,71(6):675-680.
- [14]James E.Krzanowski,Jonathan Wormwood,et al.Microstructure and mechanical properties of Mo-Si-C and Zr-Si-C thin films:Compositional routes for film densification and hardness enhancement[J].Surface&Coatings Technology 2007,201(6):2942-2952.
- [15]杨生荣,王金清,刘晓红.Y2O3薄膜的制备以及抗划伤性能和摩擦学性能研究[J].材料保护,2004,37(7B):97-99.YANG Sheng-rong,WANG Jin-qing,LIU Xiao-hong.Preparation of Y2O3thin films and the research of anti scratch performance and tribological properties[J].Materials Protection,2004,37(7B):97-99.
- [16]王耀华,陈广超,贺琦,等.退火对Y2O3薄膜结构和光学性能的影响[J].材料工程,2010(2):47-51.WANG Yao-hua,CHEN Guang-chao,HE Qi,et al.Effect of Annealing on structure and optical properties of Y2O3thin films[J].Materials Engineering,2010(2):47-51.
- [17]郭会斌,魏俊俊,王耀华,等.反应磁控溅射法制备Y2O3金刚石红外减反膜[J].金刚石与磨料磨具工程,2008(3):10-14.GUO Hui-bin,WEI Jun-jun,WANG Yao-hua,et al.Reactive magnetron sputtering of IR anti-reflection Y2O3coatings for freestanding CVD diamond window applications[J].Diamond&Abrasives Engineering,2008(3):10-14.
- [18]Cho M H,Ko D H,Seo J G,et al.Characteristics of Y2O3films on Si(111)grown by oxygen-ion beam-assisted deposition[J].Thin Solid Films,2001,382:288-296.
- [19]刘星,马国佳,孙刚,等气压及偏压对磁控溅射TaN薄膜力学性能影响[J].真空科学与技术学报,2013,33(1):54-60.LIU Xing,MA Guo-jia,SUN Gang,et al.Growth and property characterization of magnetron sputtered TaN[N].Chinese Journal of Vacuum Science and Technology,2013,33(1):54-60.
- [20]汪冬梅,吕珺,徐光青,等.纯Ar气氛中退火对Al掺杂ZnO薄膜性能的影响[J].材料热处理学报,2007,28(4):46-50.WANG Dong-mei,LJun,XU Guang-qing,et a.Influence of annealing in argon on properties of Al-doped zinc oxide films[J].Transactions of Materials and Heat Treatment,2007,28(4):46-50.
文章评论(Comment):
|
||||||||||||||||||
|
||||||||||||||||||