喻利花,王蕊,许俊华

• 1:江苏科技大学材料科学与工程学院
• 2:江苏省先进焊接技术重点实验室

摘要(Abstract)：

采用多靶反应磁控溅射设备制备了一系列不同基体负偏压的W-C-N复合膜。采用X射线衍射仪、扫描电镜、能量色散谱仪、纳米压痕仪和摩擦磨损仪对薄膜进行表征。结果表明:当负偏压小于等于80 V时,薄膜表现出六方α-WCN相结构,增加到120 V时,转变为立方β-WCN相,薄膜硬度、弹性模量和膜基结合力出现对应最佳性能点的峰值;随着负偏压的增大,薄膜质量得到改善,磨损率和摩擦系数明显降低,负偏压达到200 V时,磨损率和摩擦系数分别出现最低值4.22×10-6mm3.N-1.m-1和0.27;薄膜的磨损机制主要是磨粒磨损。

关键词(KeyWords)： W-C-N复合膜;磁控溅射;基体负偏压;摩擦磨损性能

Abstract:

Keywords:

基金项目(Foundation): 国家自然科学基金资助项目(51074080);; 江苏省自然科学基金资助项目(BK2008240)

作者(Author): 喻利花,王蕊,许俊华

DOI: 10.13289/j.issn.1009-6264.2013.04.001

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